ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME
Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film rate. The acid-modified novolac resin is represented by the formula 1, wherein A is an aldehyde derivative; R1 to R4 are independently H or a C1-C6 alkyl group; n is an integer of 0-3; and R is an anhydride derivative selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride. Preferably the acid modification rate of the novolac resin is 5-90 %. The method comprises the steps of reacting the novolac resin represented by the formula 2 with at least one anhydride selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride in the presence of a basic catalyst. |
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