ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME

Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film...

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Hauptverfasser: SEO, HYUN JIN, WOO, SEUNG WOO, LEE, JAE HWAN, WOO, JE SUN, CHOI, YOUNG SOO, JUNG, SANG HYUP, RYU, MI SUN, YOO, KWON YIL, CHOL, SOOK YOUNG, KIM, MIN JI, CHOI, BUM YOUNG, LEE, KEUN JOO, KIM, WOONG, JUNG, NAK CHIL, JEONG, YONG MAN, KIM, MIN SUB, PAE, YOU LEE, KIM, YOONG KEUN, CHOI, JAE LOK, HAN, CHEOL, CHA, HYUK JIN, LEE, SU HYUN
Format: Patent
Sprache:eng
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Zusammenfassung:Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film rate. The acid-modified novolac resin is represented by the formula 1, wherein A is an aldehyde derivative; R1 to R4 are independently H or a C1-C6 alkyl group; n is an integer of 0-3; and R is an anhydride derivative selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride. Preferably the acid modification rate of the novolac resin is 5-90 %. The method comprises the steps of reacting the novolac resin represented by the formula 2 with at least one anhydride selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride in the presence of a basic catalyst.