ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME
Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film...
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| creator | SEO, HYUN JIN WOO, SEUNG WOO LEE, JAE HWAN WOO, JE SUN CHOI, YOUNG SOO JUNG, SANG HYUP RYU, MI SUN YOO, KWON YIL CHOL, SOOK YOUNG KIM, MIN JI CHOI, BUM YOUNG LEE, KEUN JOO KIM, WOONG JUNG, NAK CHIL JEONG, YONG MAN KIM, MIN SUB PAE, YOU LEE KIM, YOONG KEUN CHOI, JAE LOK HAN, CHEOL CHA, HYUK JIN LEE, SU HYUN |
| description | Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film rate. The acid-modified novolac resin is represented by the formula 1, wherein A is an aldehyde derivative; R1 to R4 are independently H or a C1-C6 alkyl group; n is an integer of 0-3; and R is an anhydride derivative selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride. Preferably the acid modification rate of the novolac resin is 5-90 %. The method comprises the steps of reacting the novolac resin represented by the formula 2 with at least one anhydride selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride in the presence of a basic catalyst. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20050029055A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20050029055A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20050029055A3</originalsourceid><addsrcrecordid>eNqNy70KwkAQBOA0FqK-w4KtgSOSwnK5H--Idxtym7QhyFmJBuP7Y4I-gNUMw3zr7IXSqdyTcsZpBYE6umAFjY4uHMBjaA1KbhsXzuA1W1LAVjeaDGBQUFN07DoNtSWmRUUGSf67U5h7YHRh4bODiF5vs9VtuE9p98tNtjeapc3T-OzTNA7X9EjvvmoKIUohipMoSzz-9_oASfA5hA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME</title><source>esp@cenet</source><creator>SEO, HYUN JIN ; WOO, SEUNG WOO ; LEE, JAE HWAN ; WOO, JE SUN ; CHOI, YOUNG SOO ; JUNG, SANG HYUP ; RYU, MI SUN ; YOO, KWON YIL ; CHOL, SOOK YOUNG ; KIM, MIN JI ; CHOI, BUM YOUNG ; LEE, KEUN JOO ; KIM, WOONG ; JUNG, NAK CHIL ; JEONG, YONG MAN ; KIM, MIN SUB ; PAE, YOU LEE ; KIM, YOONG KEUN ; CHOI, JAE LOK ; HAN, CHEOL ; CHA, HYUK JIN ; LEE, SU HYUN</creator><creatorcontrib>SEO, HYUN JIN ; WOO, SEUNG WOO ; LEE, JAE HWAN ; WOO, JE SUN ; CHOI, YOUNG SOO ; JUNG, SANG HYUP ; RYU, MI SUN ; YOO, KWON YIL ; CHOL, SOOK YOUNG ; KIM, MIN JI ; CHOI, BUM YOUNG ; LEE, KEUN JOO ; KIM, WOONG ; JUNG, NAK CHIL ; JEONG, YONG MAN ; KIM, MIN SUB ; PAE, YOU LEE ; KIM, YOONG KEUN ; CHOI, JAE LOK ; HAN, CHEOL ; CHA, HYUK JIN ; LEE, SU HYUN</creatorcontrib><description>Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film rate. The acid-modified novolac resin is represented by the formula 1, wherein A is an aldehyde derivative; R1 to R4 are independently H or a C1-C6 alkyl group; n is an integer of 0-3; and R is an anhydride derivative selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride. Preferably the acid modification rate of the novolac resin is 5-90 %. The method comprises the steps of reacting the novolac resin represented by the formula 2 with at least one anhydride selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride in the presence of a basic catalyst.</description><edition>7</edition><language>eng</language><subject>CHEMISTRY ; COMPOSITIONS BASED THEREON ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050324&DB=EPODOC&CC=KR&NR=20050029055A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050324&DB=EPODOC&CC=KR&NR=20050029055A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SEO, HYUN JIN</creatorcontrib><creatorcontrib>WOO, SEUNG WOO</creatorcontrib><creatorcontrib>LEE, JAE HWAN</creatorcontrib><creatorcontrib>WOO, JE SUN</creatorcontrib><creatorcontrib>CHOI, YOUNG SOO</creatorcontrib><creatorcontrib>JUNG, SANG HYUP</creatorcontrib><creatorcontrib>RYU, MI SUN</creatorcontrib><creatorcontrib>YOO, KWON YIL</creatorcontrib><creatorcontrib>CHOL, SOOK YOUNG</creatorcontrib><creatorcontrib>KIM, MIN JI</creatorcontrib><creatorcontrib>CHOI, BUM YOUNG</creatorcontrib><creatorcontrib>LEE, KEUN JOO</creatorcontrib><creatorcontrib>KIM, WOONG</creatorcontrib><creatorcontrib>JUNG, NAK CHIL</creatorcontrib><creatorcontrib>JEONG, YONG MAN</creatorcontrib><creatorcontrib>KIM, MIN SUB</creatorcontrib><creatorcontrib>PAE, YOU LEE</creatorcontrib><creatorcontrib>KIM, YOONG KEUN</creatorcontrib><creatorcontrib>CHOI, JAE LOK</creatorcontrib><creatorcontrib>HAN, CHEOL</creatorcontrib><creatorcontrib>CHA, HYUK JIN</creatorcontrib><creatorcontrib>LEE, SU HYUN</creatorcontrib><title>ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME</title><description>Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film rate. The acid-modified novolac resin is represented by the formula 1, wherein A is an aldehyde derivative; R1 to R4 are independently H or a C1-C6 alkyl group; n is an integer of 0-3; and R is an anhydride derivative selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride. Preferably the acid modification rate of the novolac resin is 5-90 %. The method comprises the steps of reacting the novolac resin represented by the formula 2 with at least one anhydride selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride in the presence of a basic catalyst.</description><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNy70KwkAQBOA0FqK-w4KtgSOSwnK5H--Idxtym7QhyFmJBuP7Y4I-gNUMw3zr7IXSqdyTcsZpBYE6umAFjY4uHMBjaA1KbhsXzuA1W1LAVjeaDGBQUFN07DoNtSWmRUUGSf67U5h7YHRh4bODiF5vs9VtuE9p98tNtjeapc3T-OzTNA7X9EjvvmoKIUohipMoSzz-9_oASfA5hA</recordid><startdate>20050324</startdate><enddate>20050324</enddate><creator>SEO, HYUN JIN</creator><creator>WOO, SEUNG WOO</creator><creator>LEE, JAE HWAN</creator><creator>WOO, JE SUN</creator><creator>CHOI, YOUNG SOO</creator><creator>JUNG, SANG HYUP</creator><creator>RYU, MI SUN</creator><creator>YOO, KWON YIL</creator><creator>CHOL, SOOK YOUNG</creator><creator>KIM, MIN JI</creator><creator>CHOI, BUM YOUNG</creator><creator>LEE, KEUN JOO</creator><creator>KIM, WOONG</creator><creator>JUNG, NAK CHIL</creator><creator>JEONG, YONG MAN</creator><creator>KIM, MIN SUB</creator><creator>PAE, YOU LEE</creator><creator>KIM, YOONG KEUN</creator><creator>CHOI, JAE LOK</creator><creator>HAN, CHEOL</creator><creator>CHA, HYUK JIN</creator><creator>LEE, SU HYUN</creator><scope>EVB</scope></search><sort><creationdate>20050324</creationdate><title>ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME</title><author>SEO, HYUN JIN ; WOO, SEUNG WOO ; LEE, JAE HWAN ; WOO, JE SUN ; CHOI, YOUNG SOO ; JUNG, SANG HYUP ; RYU, MI SUN ; YOO, KWON YIL ; CHOL, SOOK YOUNG ; KIM, MIN JI ; CHOI, BUM YOUNG ; LEE, KEUN JOO ; KIM, WOONG ; JUNG, NAK CHIL ; JEONG, YONG MAN ; KIM, MIN SUB ; PAE, YOU LEE ; KIM, YOONG KEUN ; CHOI, JAE LOK ; HAN, CHEOL ; CHA, HYUK JIN ; LEE, SU HYUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20050029055A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>SEO, HYUN JIN</creatorcontrib><creatorcontrib>WOO, SEUNG WOO</creatorcontrib><creatorcontrib>LEE, JAE HWAN</creatorcontrib><creatorcontrib>WOO, JE SUN</creatorcontrib><creatorcontrib>CHOI, YOUNG SOO</creatorcontrib><creatorcontrib>JUNG, SANG HYUP</creatorcontrib><creatorcontrib>RYU, MI SUN</creatorcontrib><creatorcontrib>YOO, KWON YIL</creatorcontrib><creatorcontrib>CHOL, SOOK YOUNG</creatorcontrib><creatorcontrib>KIM, MIN JI</creatorcontrib><creatorcontrib>CHOI, BUM YOUNG</creatorcontrib><creatorcontrib>LEE, KEUN JOO</creatorcontrib><creatorcontrib>KIM, WOONG</creatorcontrib><creatorcontrib>JUNG, NAK CHIL</creatorcontrib><creatorcontrib>JEONG, YONG MAN</creatorcontrib><creatorcontrib>KIM, MIN SUB</creatorcontrib><creatorcontrib>PAE, YOU LEE</creatorcontrib><creatorcontrib>KIM, YOONG KEUN</creatorcontrib><creatorcontrib>CHOI, JAE LOK</creatorcontrib><creatorcontrib>HAN, CHEOL</creatorcontrib><creatorcontrib>CHA, HYUK JIN</creatorcontrib><creatorcontrib>LEE, SU HYUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SEO, HYUN JIN</au><au>WOO, SEUNG WOO</au><au>LEE, JAE HWAN</au><au>WOO, JE SUN</au><au>CHOI, YOUNG SOO</au><au>JUNG, SANG HYUP</au><au>RYU, MI SUN</au><au>YOO, KWON YIL</au><au>CHOL, SOOK YOUNG</au><au>KIM, MIN JI</au><au>CHOI, BUM YOUNG</au><au>LEE, KEUN JOO</au><au>KIM, WOONG</au><au>JUNG, NAK CHIL</au><au>JEONG, YONG MAN</au><au>KIM, MIN SUB</au><au>PAE, YOU LEE</au><au>KIM, YOONG KEUN</au><au>CHOI, JAE LOK</au><au>HAN, CHEOL</au><au>CHA, HYUK JIN</au><au>LEE, SU HYUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME</title><date>2005-03-24</date><risdate>2005</risdate><abstract>Provided are an acid-modified novolac resin whose dissolution velocity to an alkali developer is controlled according to the acid modification rate, its preparation method, and a positive type photoresist composition containing the resin which is improved in development, resolution and residual film rate. The acid-modified novolac resin is represented by the formula 1, wherein A is an aldehyde derivative; R1 to R4 are independently H or a C1-C6 alkyl group; n is an integer of 0-3; and R is an anhydride derivative selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride. Preferably the acid modification rate of the novolac resin is 5-90 %. The method comprises the steps of reacting the novolac resin represented by the formula 2 with at least one anhydride selected from the group consisting of phthalic anhydride, succinic anhydride and maleic anhydride in the presence of a basic catalyst.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMISTRY COMPOSITIONS BASED THEREON MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | ACID-MODIFIED NOVOLAK RESIN, MANUFACTURING METHOD THEREOF AND POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME |
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