APPARATUS FOR EXPOSING WAFER EDGE AND CHECKING SIMULTANEOUSLY WIDTH OF EXPOSED WAFER EDGE

APPARATUS FOR EXPOSING WAFER EDGE AND CHECKING SIMULTANEOUSLY WIDTH OF EXPOSED WAFER EDGE

PURPOSE: An apparatus for exposing a wafer edge is provided to simplify exposing processes and to improve the reliability of exposure by checking easily the width of an exposed portion of the wafer edge using a CCD(Charge Coupled Device) and an arithmetic unit. CONSTITUTION: An apparatus(1) for expo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIM, JONG KILL, OH, GYEONG HWAN, SHIN, DONG HWA, PARK, YOUNG HO, LEE, MYUNG KEUN
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PURPOSE: An apparatus for exposing a wafer edge is provided to simplify exposing processes and to improve the reliability of exposure by checking easily the width of an exposed portion of the wafer edge using a CCD(Charge Coupled Device) and an arithmetic unit. CONSTITUTION: An apparatus(1) for exposing a wafer edge includes a wafer chuck(11) for loading a wafer(W), a light source(13) over the chuck, an optical fiber(15) for guiding a beam of the light source to an edge of the wafer, a CCD and an arithmetic unit. The CCD(17) is used for recognizing an image of the exposed width of the wafer edge by using the beam reflected from the wafer edge. The arithmetic unit(19) is used for calculating the value of the exposed width based on data of the CCD.