EXPOSURE APPARATUS TO EXTEND LIFETIME OF LIGHT SOURCE AND INCREASE OUTPUT

PURPOSE: An exposure apparatus is provided to extend the lifetime of a light source and increase an output by generating the light necessary for an exposure process by an electrodeless plasma method. CONSTITUTION: A wafer is placed on a wafer chuck. A light source(20) generates predetermined light b...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LIM, JONG KILL, KIM, JIN MAN, SHIN, DONG HWA, YANG, YUN SIK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE: An exposure apparatus is provided to extend the lifetime of a light source and increase an output by generating the light necessary for an exposure process by an electrodeless plasma method. CONSTITUTION: A wafer is placed on a wafer chuck. A light source(20) generates predetermined light by an electrodeless plasma method, installed in the upper part of the wafer chuck. The light source includes an electrodeless pipe(21) made of a transparent material wherein the electrodeless pipe is filled with a filling material of inert gas. A plurality of ferrite cores(22) are installed at both sides of the electrodeless pipe. A coil(23) is wound around the outer circumferential surface of the ferrite core. RF(radio frequency) power is connected to the coil.