PHOTORESIST COMPOSITION FOR SPINLESS COATING CAPABLE OF FORMING UNIFORM COATING LAYER ON SUBSTRATE

PURPOSE: Provided is a photoresist composition for spinless coating, which forms a uniform coating layer when forming an organic interlayer dielectric film, etc., on a substrate, and facilitates control of the edge profile of a coating layer. CONSTITUTION: The photoresist composition for spinless co...

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Hauptverfasser:	JUNG, SANG HYEOP, KIM, UNG, CHOI, BEOM YEONG, KIM, YEONG GEUN, WOO, SEUNG U, YOO, GWON IL, LEE, JAE HWAN, CHOI, SUK YEONG, BAE, YU RI, KIM, MIN JI, CHA, HYEOK JIN, JUNG, NAK CHIL, CHOI, YEONG SU, LEE, SU HYEON, LEE, GEUN JU, WOO, JE SEON, HONG, SEONG JAE, CHOI, JAE ROK, JUNG, YONG MAN, SEO, HYEON JIN, HAN, CHEOL, RYU, MI SEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE: Provided is a photoresist composition for spinless coating, which forms a uniform coating layer when forming an organic interlayer dielectric film, etc., on a substrate, and facilitates control of the edge profile of a coating layer. CONSTITUTION: The photoresist composition for spinless coating comprises: 5-40 parts by weight of an acrylic binder resin; 2-200 parts by weight of a multifunctional monomer having an ethylenically unsaturated bond, 0.005-20 parts by weight of a photoinitiator; 0.001-3 parts by weight of a silicon-containing compound having an epoxy or amine group; and 0.01-3 parts by weight of a fluorine- or silicon-containing surfactant, and further comprises a solvent added in such an amount that the viscosity of the composition is 2-20 cps.