APPARATUS FOR INSPECTING WAFER EDGE TO REDUCE TIME FOR INSPECTION PROCESS
PURPOSE: An apparatus for inspecting a wafer edge is provided to reduce a time for an inspection process and enhance reliability by inspecting a defect of a wafer edge according to intensity of light reflected from the wafer edge. CONSTITUTION: A chuck(110) is used for supporting a wafer. A pluralit...
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Format: | Patent |
Sprache: | eng ; kor |
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