APPARATUS FOR INSPECTING WAFER EDGE TO REDUCE TIME FOR INSPECTION PROCESS

APPARATUS FOR INSPECTING WAFER EDGE TO REDUCE TIME FOR INSPECTION PROCESS

PURPOSE: An apparatus for inspecting a wafer edge is provided to reduce a time for an inspection process and enhance reliability by inspecting a defect of a wafer edge according to intensity of light reflected from the wafer edge. CONSTITUTION: A chuck(110) is used for supporting a wafer. A pluralit...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: KIM, HUI DEOK
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:PURPOSE: An apparatus for inspecting a wafer edge is provided to reduce a time for an inspection process and enhance reliability by inspecting a defect of a wafer edge according to intensity of light reflected from the wafer edge. CONSTITUTION: A chuck(110) is used for supporting a wafer. A plurality of optical sensors(120,124,126) are arranged nearly to an edge part of the wafer. Each optical sensor includes a light emitting unit for irradiating the light on the edge and a receiving part for receiving the light reflected from the edge part. A handling unit is connected to the chuck in order to scan the edge part of the wafer. A central processing unit determines correctly a defect of a wafer edge according to a detecting state of the reflected light.