LITHOGRAPHIC APPARATUS FOR COUNTERVAILING INFLUENCE OF THICK PELLICLE, DEVICE MANUFACTURING METHOD, MASK, AND MASK AND/OR PELLICLE CHARACTERIZING METHOD

PURPOSE: A lithographic apparatus, a device manufacturing method, a mask, and a mask and/or pellicle characterizing method are provided to countervail the influence of a thick pellicle by controlling exactly each part of the lithographic apparatus using a controller. CONSTITUTION: A lithographic app...

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Bibliographische Detailangaben
Hauptverfasser:	JASPER JOHANNES CHRISTIAAN MARIA, PONGERS WILLEM RICHARD, BOOM HERMAN, JANSEN ALBERT JOHANNES MARIA, HOFMANS GERARDUS CAROLUS JOHANNUS, BRULS RICHARD JOSEPH, UITTERDIJK TAMMO, CICILIA ORLANDO SERAPIO, DEMARTEAU MARCEL JOHANNES LOUIS MARIE, WEHRENS MARTIJN GERARD DOMINIQUE, VANDIJCK HENDRIKUS ALPHONSUS LUDOVICUS, BAGGEN MARCEL KOENRAAD MARIE, LUIJTEN CARLO CORNELIS MARIA
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A lithographic apparatus, a device manufacturing method, a mask, and a mask and/or pellicle characterizing method are provided to countervail the influence of a thick pellicle by controlling exactly each part of the lithographic apparatus using a controller. CONSTITUTION: A lithographic apparatus includes an illuminator(IL) for providing a projection beam(PB) of radiation, a support structure(MT) for supporting a patterning device(MA), a substrate table(WT) for loading a substrate(W), a projection system(PL) for projecting a patterned beam on a target of the substrate, and a controller. The controller is used for compensating or improving the displacement of an apparent mask position and image aberrations by controlling the apparatus.