1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE-BASED SENSITIZER SHOWING NO I-LINE ABSORPTION AND HAVING IMPROVED SOLUBILITY AND PHOTORESIST COMPOSITION CONTAINING THE SENSITIZER

1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE-BASED SENSITIZER SHOWING NO I-LINE ABSORPTION AND HAVING IMPROVED SOLUBILITY AND PHOTORESIST COMPOSITION CONTAINING THE SENSITIZER

PURPOSE: Provided are a 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer which can be prepared by easily, shows no i-line absorption and is improved in solubility by converting some of the hydroxyl group of a cyclic polyhydroxy compound into a 1,2-naphthoquinone-2-diazidesulfonyl group and an...

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Bibliographische Detailangaben
Hauptverfasser: MIYAZAKI TSUNEAKI, TADA KATSUMI, KATORI SUEHIRO
Format: Patent
Sprache:eng ; kor
Schlagworte:
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Zusammenfassung:PURPOSE: Provided are a 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer which can be prepared by easily, shows no i-line absorption and is improved in solubility by converting some of the hydroxyl group of a cyclic polyhydroxy compound into a 1,2-naphthoquinone-2-diazidesulfonyl group and an arylsulfonyl group and a photoresist composition containing the sensitizer which is improved in the sensitivity and the ratio of residual layers. CONSTITUTION: The 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer is represented by the formula 1, wherein R1, R2, R3 and R4 are independently C2-C9 alkyl group; and D1 to D8 are independently one another, at least two of them are a 1,2-naphthoquinone-2-diazidesulfonyl group, at least one of the rest is an arylsulfonyl group and the rest are H. The photoresist composition comprises the 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer of the formula 1; and an alkali-soluble resin.