WAFER DETECTING APPARATUS FOR WAFER TRANSFER APPARATUS AND WAFER DETECTING METHOD

WAFER DETECTING APPARATUS FOR WAFER TRANSFER APPARATUS AND WAFER DETECTING METHOD

PURPOSE: A wafer detecting method is provided to prevent a process defect caused by a wafer defect by calculating the weight value of a wafer loaded into the upper surface of a transfer arm and by detecting whether the wafer is damaged while determining whether the wafer exists on the upper surface...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: AHN, HYEON SU
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PURPOSE: A wafer detecting method is provided to prevent a process defect caused by a wafer defect by calculating the weight value of a wafer loaded into the upper surface of a transfer arm and by detecting whether the wafer is damaged while determining whether the wafer exists on the upper surface of the transfer arm. CONSTITUTION: A wafer is loaded into the upper surface of a transfer arm(21). The weight value of the loaded wafer is calculated. The calculated weight value is compared with a reference value and is determined to be normal or abnormal. Equipment is stopped when an abnormal state occurs.