QUARTZ LIFTER OF A SEMICONDUCTOR MANUFACTURE
PURPOSE: A quartz lifter of semiconductor equipment is provided to prevent an error such as resistance lowering in a rinsing process of last step of a cleaning by removing completely the chemical residue using a nozzle for spraying DIW(DeIonized Water). CONSTITUTION: A quartz lifter(60) is used for...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | PURPOSE: A quartz lifter of semiconductor equipment is provided to prevent an error such as resistance lowering in a rinsing process of last step of a cleaning by removing completely the chemical residue using a nozzle for spraying DIW(DeIonized Water). CONSTITUTION: A quartz lifter(60) is used for dipping a plurality of wafers(w) into an inner bath. The quartz lifter includes a lifter body(62) and a vertical part(64). The lifter body is used for supporting an edge of each wafer. The vertical part is prolonged from one end of the lifter body. An opened lift part(64a) is formed on the vertical part. A nozzle(70) is fixed to the lift part. The nozzle is used for removing chemicals of the vertical part by spraying DIW.
본 발명은 반도체 장비의 쿼츠 리프터에 관한 것이다. 본 발명은 쿼츠 리프터의 수직면 중 개구된 리프트부에 초순수의 샤워기능을 가지는 노즐이 설치되는 것을 특징으로 한다. 따라서 퀴츠 리프터에 묻어 있는 케미칼을 제거할 수 있도록 쿼츠 리프터에 초순수 노즐을 신설함으로서, 세정공정의 마지막 린스 과정에서 저항값이 저하되는 에러의 방지로 공정 소요 시간이 단축되며, 초순수의 사용량 절감의 효과가 있다. |
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