Apparatus for manufacturing semiconductor devices

PURPOSE: An apparatus for manufacturing semiconductor is provided to etch easily and rapidly only an edge of a wafer by using a gas injection nozzle for injecting nitrogen gas to prevent the flow of chemicals to a wafer shielding side. CONSTITUTION: An apparatus for manufacturing semiconductor inclu...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YOON, GWANG UI, HAN, JAE SEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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