METHOD FOR FABRICATING ALUMINUM NITRIDE SUBSTRATE TO FABRICATE OPTIMIZED AlN SUBSTRATE FOR SUPPORT UNIT FOR ELECTRONIC PART OF LOW VOLTAGE APPLICATION PART
PURPOSE: A method for fabricating an aluminum nitride substrate is provided to fabricate an optimized AlN substrate for a support unit for an electronic part of a low voltage application part by spraying powder including AlN particles on the support unit at a high temperature and a high speed. CONST...
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| creator | JARRIGE JEAN FERRATO MARC PETITBON ALAIN |
| description | PURPOSE: A method for fabricating an aluminum nitride substrate is provided to fabricate an optimized AlN substrate for a support unit for an electronic part of a low voltage application part by spraying powder including AlN particles on the support unit at a high temperature and a high speed. CONSTITUTION: Powder is sprayed on the support unit at a high temperature and a high speed to form a substrate. The powder including the AlN particles are covered with an oxide precursor material layer that forms a liquid in the periphery of the AlN particles during a spray process and is selected from an oxide precursor material for forming an oxide. |
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CONSTITUTION: Powder is sprayed on the support unit at a high temperature and a high speed to form a substrate. 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CONSTITUTION: Powder is sprayed on the support unit at a high temperature and a high speed to form a substrate. The powder including the AlN particles are covered with an oxide precursor material layer that forms a liquid in the periphery of the AlN particles during a spray process and is selected from an oxide precursor material for forming an oxide.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS REFRACTORIES SEMICONDUCTOR DEVICES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE |
| title | METHOD FOR FABRICATING ALUMINUM NITRIDE SUBSTRATE TO FABRICATE OPTIMIZED AlN SUBSTRATE FOR SUPPORT UNIT FOR ELECTRONIC PART OF LOW VOLTAGE APPLICATION PART |
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