METHOD AND APPARATUS FOR IMPROVING SILICON PROCESSING EFFICIENCY

PURPOSE: Provided is a method for processing polycrystalline silicon workpieces to form size distributions of polycrystalline silicon pieces suitable for use in a Czochralski-type process. CONSTITUTION: A polycrystalline silicon workpiece is prepared by a chemical vapor deposition process. The polyc...

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Bibliographische Detailangaben
Hauptverfasser: GRAHAM TODD STANLEY, HORSTMAN TERENCE LEE, SCHMIDT CHRIS TIM, ARVIDSON ARVID NEIL, MESSNER KATHRYN ELIZABETH
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: Provided is a method for processing polycrystalline silicon workpieces to form size distributions of polycrystalline silicon pieces suitable for use in a Czochralski-type process. CONSTITUTION: A polycrystalline silicon workpiece is prepared by a chemical vapor deposition process. The polycrystalline silicon workpiece fractures into a mixture of polycrystalline silicon pieces, where the polycrystalline silicon pieces have varying sizes. The mixture of polycrystalline silicon pieces sorts into at least two size distributions. The sorting step is carried out using a rotary indent classifier. The rotary indent classifier includes a rotating cylinder(200) and a conveyor(408). The cylinder(200) further includes a circumferential edge with indents arrayed in increasing size from a first end(210) of the cylinder to a second end(220) of the cylinder. The conveyor is longitudinally elongated, adjacent the cylinder for conveying silicon pieces from the first end of the cylinder to the second end of the cylinder.