Apparatus for etching semiconductor substitute

PURPOSE: An apparatus for etching a semiconductor substrate is provided to reduce etching cost by replacing abrasion portion alone when a quartz ring is worn. CONSTITUTION: An apparatus for etching a semiconductor substrate is provided with a process chamber(10), a chuck(20) located at the lower por...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BANG, MIN GYU, BAE, GYEONG JEONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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