EXPOSURE METHOD AND EXPOSURE APPARATUS

PURPOSE: An exposure method and an exposure apparatus are provided to improve contrast of exposure amount distribution related to a pattern of lower contrast by exposing a resist with a pattern image of a mask having patterns different with respect to contrast of image. CONSTITUTION: A first exposur...

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Bibliographische Detailangaben
Hauptverfasser:	SUGITA MITSURO, SAITOH KENJI, SUZUKI AKIYOSHI, KAWASHIMA MIYOKO, IWASAKI YUICHI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: An exposure method and an exposure apparatus are provided to improve contrast of exposure amount distribution related to a pattern of lower contrast by exposing a resist with a pattern image of a mask having patterns different with respect to contrast of image. CONSTITUTION: A first exposure process is performed to apply the first exposure amount distribution to the first resist on the basis of the predetermined exposure. A second exposure process is performed to apply the second exposure amount distribution including the first part and the second part having the predetermined exposure amount to the resist. The exposure process for the first part of a predetermined pattern is performed by overlapping a part of the first exposure amount distribution with the first part of the second exposure amount distribution. In addition, the exposure process for the second part of the predetermined pattern is performed by overlapping a part of the first exposure amount distribution with the second part of the second exposure amount distribution.