APPARATUS FOR CLEANING PATTERN MASK AND EXPOSURE EQUIPMENT HAVING THE SAME

PURPOSE: An apparatus for cleaning a pattern mask and an exposure equipment including the same are provided to remarkably shorten a time interval of an exposure process by preventing a pattern mask from being rejected by slight contaminants that are attached to the pattern mask and can easily be eli...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM, DAE HYEON, KIM, GWANG GI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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