APPARATUS FOR CLEANING PATTERN MASK AND EXPOSURE EQUIPMENT HAVING THE SAME

APPARATUS FOR CLEANING PATTERN MASK AND EXPOSURE EQUIPMENT HAVING THE SAME

PURPOSE: An apparatus for cleaning a pattern mask and an exposure equipment including the same are provided to remarkably shorten a time interval of an exposure process by preventing a pattern mask from being rejected by slight contaminants that are attached to the pattern mask and can easily be eli...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KIM, DAE HYEON, KIM, GWANG GI
Format: Patent
Sprache:eng ; kor
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PURPOSE: An apparatus for cleaning a pattern mask and an exposure equipment including the same are provided to remarkably shorten a time interval of an exposure process by preventing a pattern mask from being rejected by slight contaminants that are attached to the pattern mask and can easily be eliminated. CONSTITUTION: Cleaning gas is stored in a cleaning gas storage tank(120). The cleaning gas stored in the cleaning gas storage tank is transferred through a cleaning gas transfer pipe. A switch valve selectively switches on/off the cleaning gas transfer pipe. A cleaning gas injection unit(130) injects the cleaning gas to the pattern mask(170). A pattern mask detection unit(160) detects the pattern mask and determines when to inject the cleaning gas. 패턴 마스크 클리닝 장치 및 이를 갖는 노광 설비가 개시되어 있다. 패턴 마스크를 검사하는 패턴 마스크 검사기 및 패턴 마스크가 수납된 패턴 마스크 캐리어의 사이에 패턴 마스크 클리닝 장치를 위치하여 패턴 마스크에 부착된 미세 파티클 등을 제거한 후 패턴 마스크를 패턴 마스크 검사기로 이송한다. 이로써, 패턴 마스크 검사기에서 미세 파티클에 의하여 패턴 마스크가 리젝트 되는 것을 최소화하여 노광 공정에 소요되는 시간을 크게 단축시킬 수 있는 효과를 갖는다.