LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD
PURPOSE: A lithography projection apparatus, a method for preparing a device and a device prepared by the method, a method for determining a substrate to be imaged previously and a substrate are provided, to improve the image performance of a lithography process by using a dual stage lithography app...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | ROSSING HARM ROELOF VANDENBRINK MARINUS AART GEORGE RICHARD ALEXANDER |
| description | PURPOSE: A lithography projection apparatus, a method for preparing a device and a device prepared by the method, a method for determining a substrate to be imaged previously and a substrate are provided, to improve the image performance of a lithography process by using a dual stage lithography apparatus. CONSTITUTION: The lithography projection apparatus comprises a light emission system which supplies a projection beam; a support structure which supports a patterning means patterning the projection beam according to a certain pattern; a first substrate holder(WT1) which holds a substrate(W1); a second substrate holder(WT2) which holds a substrate(W2); a projection system which projects the patterned projection beam on the target area of the substrate; and a means for controlling imaging to reduce the effect due to the difference of the two substrate holders when a second pattern is imaged on the substrate where a first pattern is imaged. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20040002486A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20040002486A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20040002486A3</originalsourceid><addsrcrecordid>eNrjZAj18Qzx8HcPcgzwiFRwDAhwDHIMCQ3WUQgIcgWzPf39FHxdgUpcFPzdFFxcwzydXRUc_VxgTIg6VxcFp0iFEA9XqFoeBta0xJziVF4ozc2g7OYa4uyhm1qQH59aXJCYnJqXWhLvHWRkYGBiYGBgZGJh5mhMnCoACxww8g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD</title><source>esp@cenet</source><creator>ROSSING HARM ROELOF ; VANDENBRINK MARINUS AART ; GEORGE RICHARD ALEXANDER</creator><creatorcontrib>ROSSING HARM ROELOF ; VANDENBRINK MARINUS AART ; GEORGE RICHARD ALEXANDER</creatorcontrib><description>PURPOSE: A lithography projection apparatus, a method for preparing a device and a device prepared by the method, a method for determining a substrate to be imaged previously and a substrate are provided, to improve the image performance of a lithography process by using a dual stage lithography apparatus. CONSTITUTION: The lithography projection apparatus comprises a light emission system which supplies a projection beam; a support structure which supports a patterning means patterning the projection beam according to a certain pattern; a first substrate holder(WT1) which holds a substrate(W1); a second substrate holder(WT2) which holds a substrate(W2); a projection system which projects the patterned projection beam on the target area of the substrate; and a means for controlling imaging to reduce the effect due to the difference of the two substrate holders when a second pattern is imaged on the substrate where a first pattern is imaged.</description><edition>7</edition><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040107&DB=EPODOC&CC=KR&NR=20040002486A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25553,76306</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040107&DB=EPODOC&CC=KR&NR=20040002486A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ROSSING HARM ROELOF</creatorcontrib><creatorcontrib>VANDENBRINK MARINUS AART</creatorcontrib><creatorcontrib>GEORGE RICHARD ALEXANDER</creatorcontrib><title>LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD</title><description>PURPOSE: A lithography projection apparatus, a method for preparing a device and a device prepared by the method, a method for determining a substrate to be imaged previously and a substrate are provided, to improve the image performance of a lithography process by using a dual stage lithography apparatus. CONSTITUTION: The lithography projection apparatus comprises a light emission system which supplies a projection beam; a support structure which supports a patterning means patterning the projection beam according to a certain pattern; a first substrate holder(WT1) which holds a substrate(W1); a second substrate holder(WT2) which holds a substrate(W2); a projection system which projects the patterned projection beam on the target area of the substrate; and a means for controlling imaging to reduce the effect due to the difference of the two substrate holders when a second pattern is imaged on the substrate where a first pattern is imaged.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAj18Qzx8HcPcgzwiFRwDAhwDHIMCQ3WUQgIcgWzPf39FHxdgUpcFPzdFFxcwzydXRUc_VxgTIg6VxcFp0iFEA9XqFoeBta0xJziVF4ozc2g7OYa4uyhm1qQH59aXJCYnJqXWhLvHWRkYGBiYGBgZGJh5mhMnCoACxww8g</recordid><startdate>20040107</startdate><enddate>20040107</enddate><creator>ROSSING HARM ROELOF</creator><creator>VANDENBRINK MARINUS AART</creator><creator>GEORGE RICHARD ALEXANDER</creator><scope>EVB</scope></search><sort><creationdate>20040107</creationdate><title>LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD</title><author>ROSSING HARM ROELOF ; VANDENBRINK MARINUS AART ; GEORGE RICHARD ALEXANDER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20040002486A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2004</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ROSSING HARM ROELOF</creatorcontrib><creatorcontrib>VANDENBRINK MARINUS AART</creatorcontrib><creatorcontrib>GEORGE RICHARD ALEXANDER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ROSSING HARM ROELOF</au><au>VANDENBRINK MARINUS AART</au><au>GEORGE RICHARD ALEXANDER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD</title><date>2004-01-07</date><risdate>2004</risdate><abstract>PURPOSE: A lithography projection apparatus, a method for preparing a device and a device prepared by the method, a method for determining a substrate to be imaged previously and a substrate are provided, to improve the image performance of a lithography process by using a dual stage lithography apparatus. CONSTITUTION: The lithography projection apparatus comprises a light emission system which supplies a projection beam; a support structure which supports a patterning means patterning the projection beam according to a certain pattern; a first substrate holder(WT1) which holds a substrate(W1); a second substrate holder(WT2) which holds a substrate(W2); a projection system which projects the patterned projection beam on the target area of the substrate; and a means for controlling imaging to reduce the effect due to the difference of the two substrate holders when a second pattern is imaged on the substrate where a first pattern is imaged.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20040002486A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T08%3A51%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ROSSING%20HARM%20ROELOF&rft.date=2004-01-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20040002486A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |