LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD

PURPOSE: A lithography projection apparatus, a method for preparing a device and a device prepared by the method, a method for determining a substrate to be imaged previously and a substrate are provided, to improve the image performance of a lithography process by using a dual stage lithography apparatus. CONSTITUTION: The lithography projection apparatus comprises a light emission system which supplies a projection beam; a support structure which supports a patterning means patterning the projection beam according to a certain pattern; a first substrate holder(WT1) which holds a substrate(W1); a second substrate holder(WT2) which holds a substrate(W2); a projection system which projects the patterned projection beam on the target area of the substrate; and a means for controlling imaging to reduce the effect due to the difference of the two substrate holders when a second pattern is imaged on the substrate where a first pattern is imaged.