1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE-BASED SENSITIZER, PREPARATION METHOD THEREOF AND PHOTORESIST COMPOSITION
PURPOSE: A 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer, its preparation method and a photoresist composition containing the sensitizer are provided, to obtain a satisfactory sensitivity, an excellent storage stability and a high solubility in solvents. CONSTITUTION: The 1,2-naphthoquinone...
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| creator | MIYAZAKI TSUNEAKI SUWA MIHARU IIDA HIROTADA TADA KATSUMI HAGIWARA YUICHI KATORI SUEHIRO |
| description | PURPOSE: A 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer, its preparation method and a photoresist composition containing the sensitizer are provided, to obtain a satisfactory sensitivity, an excellent storage stability and a high solubility in solvents. CONSTITUTION: The 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer is prepared by reacting a polyphenol with a,2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyphenol is obtained by condensation of resorcinol and at least one aldehyde selected from C3-C10 aldehydes and comprises a compound represented by the formula 1 (wherein R1, R2, R3 and R4 are independently an alkyl group of C2-C9) as a main component and 10 wt% or less of a compound having a shorter retention time measured by using GPC than that of the compound of the formula 1. The photoresist composition comprises the 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer; and an alkali-soluble resin. |
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CONSTITUTION: The 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer is prepared by reacting a polyphenol with a,2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyphenol is obtained by condensation of resorcinol and at least one aldehyde selected from C3-C10 aldehydes and comprises a compound represented by the formula 1 (wherein R1, R2, R3 and R4 are independently an alkyl group of C2-C9) as a main component and 10 wt% or less of a compound having a shorter retention time measured by using GPC than that of the compound of the formula 1. The photoresist composition comprises the 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer; and an alkali-soluble resin.</description><edition>7</edition><language>eng ; kor</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040107&DB=EPODOC&CC=KR&NR=20040002462A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25551,76302</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20040107&DB=EPODOC&CC=KR&NR=20040002462A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAZAKI TSUNEAKI</creatorcontrib><creatorcontrib>SUWA MIHARU</creatorcontrib><creatorcontrib>IIDA HIROTADA</creatorcontrib><creatorcontrib>TADA KATSUMI</creatorcontrib><creatorcontrib>HAGIWARA YUICHI</creatorcontrib><creatorcontrib>KATORI SUEHIRO</creatorcontrib><title>1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE-BASED SENSITIZER, PREPARATION METHOD THEREOF AND PHOTORESIST COMPOSITION</title><description>PURPOSE: A 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer, its preparation method and a photoresist composition containing the sensitizer are provided, to obtain a satisfactory sensitivity, an excellent storage stability and a high solubility in solvents. CONSTITUTION: The 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer is prepared by reacting a polyphenol with a,2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyphenol is obtained by condensation of resorcinol and at least one aldehyde selected from C3-C10 aldehydes and comprises a compound represented by the formula 1 (wherein R1, R2, R3 and R4 are independently an alkyl group of C2-C9) as a main component and 10 wt% or less of a compound having a shorter retention time measured by using GPC than that of the compound of the formula 1. 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CONSTITUTION: The 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer is prepared by reacting a polyphenol with a,2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyphenol is obtained by condensation of resorcinol and at least one aldehyde selected from C3-C10 aldehydes and comprises a compound represented by the formula 1 (wherein R1, R2, R3 and R4 are independently an alkyl group of C2-C9) as a main component and 10 wt% or less of a compound having a shorter retention time measured by using GPC than that of the compound of the formula 1. The photoresist composition comprises the 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer; and an alkali-soluble resin.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | 1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE-BASED SENSITIZER, PREPARATION METHOD THEREOF AND PHOTORESIST COMPOSITION |
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