1,2-NAPHTHOQUINONE-2-DIAZIDESULFONATE-BASED SENSITIZER, PREPARATION METHOD THEREOF AND PHOTORESIST COMPOSITION

PURPOSE: A 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer, its preparation method and a photoresist composition containing the sensitizer are provided, to obtain a satisfactory sensitivity, an excellent storage stability and a high solubility in solvents. CONSTITUTION: The 1,2-naphthoquinone...

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Hauptverfasser: MIYAZAKI TSUNEAKI, SUWA MIHARU, IIDA HIROTADA, TADA KATSUMI, HAGIWARA YUICHI, KATORI SUEHIRO
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer, its preparation method and a photoresist composition containing the sensitizer are provided, to obtain a satisfactory sensitivity, an excellent storage stability and a high solubility in solvents. CONSTITUTION: The 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer is prepared by reacting a polyphenol with a,2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyphenol is obtained by condensation of resorcinol and at least one aldehyde selected from C3-C10 aldehydes and comprises a compound represented by the formula 1 (wherein R1, R2, R3 and R4 are independently an alkyl group of C2-C9) as a main component and 10 wt% or less of a compound having a shorter retention time measured by using GPC than that of the compound of the formula 1. The photoresist composition comprises the 1,2-naphthoquinone-2-diazidesulfonate-based sensitizer; and an alkali-soluble resin.