Apparatus for fabrication of mask

PURPOSE: An apparatus for fabricating a mask is provided to form uniformly the thickness of photoresist coated on a mask by using a cylindrical container for receiving a chuck. CONSTITUTION: A mask(110) coated with photoresist is loaded and rotated on a chuck(106). The mask(110) is installed in the...

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Bibliographische Detailangaben
Hauptverfasser:	PARK, SEONG RYONG, KIM, YONG HYEON, HAN, U SEONG, EOM, SANG MIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: An apparatus for fabricating a mask is provided to form uniformly the thickness of photoresist coated on a mask by using a cylindrical container for receiving a chuck. CONSTITUTION: A mask(110) coated with photoresist is loaded and rotated on a chuck(106). The mask(110) is installed in the inside of a cylindrical container(112). The container(112) is installed in the inside of a chamber(104). An exhaust line(102) is used for exhausting the photoresist. A vacuum line(100) is used for controlling a vacuum state of the chamber(104). The container(112) is formed with anodized stainless steel. The thickness of the container(112) is minimized by using the anodized stainless steel. A plurality of fluid exhaust holes(108) are formed on a wall of the container(112). 마스크 제조장치에 대해 개시되어 있다. 그 장치는, 포토레지스트가 도포된 마스크를 안착시키고 회전시키는 척과 상기 척을 내재하도록 형성된 원통형의 콘테이너를 구비한다. 마스크를 안착한 척을 내재할 수 있는 원통형의 콘테이너를 구비함으로써, 마스크에 도포되는 포토레지스트의 두께를 균일하게 할 수 있는 마스크 제조장치를 제공할 수 있다.