EXPOSURE APPARATUS
PURPOSE: An exposure apparatus is provided to rapidly inspect a defect caused by a shutter and to minimize a process defect, by monitoring a switching operation of the shutter. CONSTITUTION: A light source(100) supplies light to form a pattern out of a thin film formed on a substrate(W) placed on a...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | PURPOSE: An exposure apparatus is provided to rapidly inspect a defect caused by a shutter and to minimize a process defect, by monitoring a switching operation of the shutter. CONSTITUTION: A light source(100) supplies light to form a pattern out of a thin film formed on a substrate(W) placed on a stage(130). The shutter(120) switches the exposure of the light when the light is supplied to the substrate. A monitoring unit(140) monitors the switching operation of the shutter to inspect the operation state of the shutter, connected to the shutter. |
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