RETICLE ALIGNMENT SYSTEM OF SEMICONDUCTOR DEVICE PHOTO LITHOGRAPHY EQUIPMENT AND THE METHOD THEREOF

PURPOSE: A reticle alignment system of semiconductor device photo lithography equipment and the method thereof are provided to prevent bad process caused by inaccuracy of reticle alignment and reduce the processing time by confirming its abnormality quickly without any interruption of the process. C...

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Bibliographische Detailangaben
1. Verfasser:	JUN, BONG SEOK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A reticle alignment system of semiconductor device photo lithography equipment and the method thereof are provided to prevent bad process caused by inaccuracy of reticle alignment and reduce the processing time by confirming its abnormality quickly without any interruption of the process. CONSTITUTION: An illumination unit(10) for guiding and supplying light is installed opposite to the wafer(W) and a reticle(R) with predetermined pattern is mounted on a table(14). The pattern image of the reticle is projected onto the wafer surface with its image scaled down by the lens(16). The movement of the reticle table and stage is adjusted by each driving unit(20,22) according to the signals from a controller. Detecting units(32,34) for measuring the displacement of reticle is installed to inform the ordering state of reticle to the controller.