VAPOUR-DEPOSITION MATERIAL FOR THE PRODUCTION OF HIGH-REFRACTIVE-INDEX OPTICAL LAYERS AND PROCESS FOR THE PRODUCTION OF THE VAPOUR-DEPOSITION MATERIAL

PURPOSE: A vapor-deposition material for the production of high-refractive-index optical materials, and a process for the production of the vapor-deposition material are provided, which form an optical layer having the highest refractive index and the lowest absorption rate. CONSTITUTION: A vapor-de...

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Hauptverfasser: ANTHES UWE, FRIZ MARTIN
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A vapor-deposition material for the production of high-refractive-index optical materials, and a process for the production of the vapor-deposition material are provided, which form an optical layer having the highest refractive index and the lowest absorption rate. CONSTITUTION: A vapor-deposition material for the production of high-refractive-index optical layers of titanium oxide, titanium and lanthanum oxide under reduced pressure comprises a sintered mixture having the composition TiOx+zxLa2O3, where x=1.5 to 1.8 and z=10 to 65% by weight, based on the total weight of the mixture. The constituents of the mixture are in the range of 10 to 65% by weight of lanthanum oxide, 38 to 74% by weight of titanium oxide and 2 to 7% by weight of titanium. 본 발명은, TiO+Z×LaO(여기에서, x는 1.5 내지 1.8이고, z는 혼합물의 총 중량을 기준으로 하여 10 내지 65중량%임)의 조성을 갖는 소성된 혼합물로 이루어진, 감압하에 산화티탄, 티탄 및 산화란탄의 고굴절률 광학 층을 제조하기 위한 증착 재료에 관한 것이다. 혼합물의 구성성분은 산화란탄 19 내지 65중량%, 산화티탄 38 내지 74중량% 및 티탄 2 내지 7중량%이다.