METHOD OF FORMING PHOTORESIST PATTERN, METHOD AND APPARATUS FOR FABRICATING LIQUID CRYSTAL DISPLAY INCLUDING PHOTORESIST PATTERN

PURPOSE: A method of forming a photoresist pattern, a method and an apparatus for fabricating a liquid crystal display including the photoresist pattern are provided to prevent the photoresist pattern from being deformed. CONSTITUTION: Photoresist is coated on a substrate(100). The photoresist is ha...

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Bibliographische Detailangaben
Hauptverfasser:	PARK, SEONG U, KIM, HAN GI, KIM, GWANG GI, LEE, CHEOL U
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	PURPOSE: A method of forming a photoresist pattern, a method and an apparatus for fabricating a liquid crystal display including the photoresist pattern are provided to prevent the photoresist pattern from being deformed. CONSTITUTION: Photoresist is coated on a substrate(100). The photoresist is hardened(200). The substrate on which the photoresist is coated is cooled down inside an exposure chamber for exposing the photoresist(300). The photoresist is exposed(400). The photoresist is developed(500). In the step of cooling down the substrate, the substrate comes into contact with a metal plate for fixing the substrate. The metal plate corresponds to a transferring part for transferring the substrate. The transferring part has a temperature sensor for measuring the temperature of the substrate.