OPENING/SHUTTING DEVICE OF RAPID THERMAL PROCESSING EQUIPMENT

PURPOSE: An opening/shutting device of rapid thermal processing equipment is provided to prevent a sliding state of a wafer by controlling automatically an opening and shutting operation of a door. CONSTITUTION: The furnace(101) is used as a heating source for providing necessary heat to a processin...

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Bibliographische Detailangaben
Hauptverfasser:	OH, JEONG SEOP, CHO, SUN HYEONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: An opening/shutting device of rapid thermal processing equipment is provided to prevent a sliding state of a wafer by controlling automatically an opening and shutting operation of a door. CONSTITUTION: The furnace(101) is used as a heating source for providing necessary heat to a processing space. A tube(102) formed with a quartz is arranged in an inner side of the furnace(101). A wafer tray(105) is arranged in an inside of the tube(102). The wafer tray(105) fixes and supports a wafer during a thermal process. A compression plate(103) and a door(104) are used for opening or shutting the processing space. An opening/shutting portion includes a luminous section(107) and a light receiving sensor(108). The luminous section(107) is arranged through a penetrating hole(106) of the compression plate(103). The luminous section(107) and the light receiving sensor(108) are connected with a control portion(109).