METHOD FOR MAINTAINING SYSTEM OF SEMICONDUCTOR EQUIPMENT

PURPOSE: A method for maintaining a system of semiconductor equipment is provided to effectively reduce system particles in an atomic layer deposition(ALD) process and to reduce the quantity of supplied gas in a chemical vapor deposition(CVD) process, by using an on/off pulsing method when a process...

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Bibliographische Detailangaben
Hauptverfasser:	CHOI, GIL HYEON, KANG, SANG BEOM, LIM, HYEON SEOK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE: A method for maintaining a system of semiconductor equipment is provided to effectively reduce system particles in an atomic layer deposition(ALD) process and to reduce the quantity of supplied gas in a chemical vapor deposition(CVD) process, by using an on/off pulsing method when a process is not performed. CONSTITUTION: Inert gas is supplied to the inside of a chamber of the system through a gas supply line by an on/off method when the system is not in operation, so that the particle inside the chamber is reduced. Argon is supplied through an argon supply line connected to a TiCl4 supply line connected to the inside of the chamber. The argon supplied to the chamber is stopped. Argon is supplied through the argon supply line connected to a NH3 supply line connected to the chamber. The argon supplied to the chamber is stopped.