NOVEL GROUP IV METAL PRECURSOR AND CHEMICAL VAPOR DEPOSITION METHOD USING THE SAME

PURPOSE: A novel group IV metal precursor is provided which displays superior volatility and thermal characteristics, has excellent chemical stability for hydrolysis, and is particularly suitable for the formation of a multi-component metal oxide thin film comprising a group IV metal such as titaniu...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHOI, BO HYEON, LIM, SEON GWON, LEE, IK MO, CHO, YEONG JIN, KIM, DAE SIK, LEE, WAN IN, MIN, YO SEP
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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