METHOD FOR FORMING ALIGNMENT LAYER
PURPOSE: A method for forming an alignment layer is provided to easily form an alignment layer at a low cost and to reduce the potential impurities on the surface of an alignment layer due to extraneous debris. CONSTITUTION: A film(an aligned atomic structure) is adhered and aligned on a substrate(1...
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Format: | Patent |
Sprache: | eng ; kor |
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Zusammenfassung: | PURPOSE: A method for forming an alignment layer is provided to easily form an alignment layer at a low cost and to reduce the potential impurities on the surface of an alignment layer due to extraneous debris. CONSTITUTION: A film(an aligned atomic structure) is adhered and aligned on a substrate(11). The method comprises a step to deposit the film on the substrate by shooting an ion-beam(4) at the substrate with a specified incident angle and simultaneously and adhering the film to the substrate and another step to align an atomic structure of the film in at least a specified aligning direction. |
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