METHOD FOR FORMING ALIGNMENT LAYER

PURPOSE: A method for forming an alignment layer is provided to easily form an alignment layer at a low cost and to reduce the potential impurities on the surface of an alignment layer due to extraneous debris. CONSTITUTION: A film(an aligned atomic structure) is adhered and aligned on a substrate(1...

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Bibliographische Detailangaben
Hauptverfasser: GALLIGAN EILEEN ANN, JAMES ANDREW LACEY, JAMES PATRICK DOYLE, MINHA RUU, NAKANO HIROKI, SHUI CHIN ALAN RYAN, CALLEGARI ALEXANDRO, KATO YOSHIMINE, PURAVIIN CHOOD HARRY
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:PURPOSE: A method for forming an alignment layer is provided to easily form an alignment layer at a low cost and to reduce the potential impurities on the surface of an alignment layer due to extraneous debris. CONSTITUTION: A film(an aligned atomic structure) is adhered and aligned on a substrate(11). The method comprises a step to deposit the film on the substrate by shooting an ion-beam(4) at the substrate with a specified incident angle and simultaneously and adhering the film to the substrate and another step to align an atomic structure of the film in at least a specified aligning direction.