Novel Bismethyl-halo-phenylsulfonyldiazomethanes and their preparation
PURPOSE: Provided are novel bis(methyl-halo-phenylsulfonyl)diazomethane compounds used as a photoacid generator in a preparation of semiconductor devices, which is excellent in transmittance, absorbency, and heat-stability. CONSTITUTION: The bis(methyl-halo-phenylsulfonyl)diazomethane compounds repr...
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Zusammenfassung: | PURPOSE: Provided are novel bis(methyl-halo-phenylsulfonyl)diazomethane compounds used as a photoacid generator in a preparation of semiconductor devices, which is excellent in transmittance, absorbency, and heat-stability. CONSTITUTION: The bis(methyl-halo-phenylsulfonyl)diazomethane compounds represented by the formula(I) are produced by reacting compounds represented by the formula(II) and the formula(III) in at least one solvent selected from the group consisting of methanol, ethanol, propanol, isopropanol, acetone, 1,4-dioxane, or water in the presence of at least one base selected from the group consisting of sodium hydroxide, potassium hydroxide, sodium methoxide, sodium ethoxide, pyridine, piperidine, morpholine, triethylamine, and N-methyl pyrrolidine.
본 발명은 화학증폭에 바탕을 둔 반도체용 초미세가공 재료의 일부로서 초고집적반도체 등의 반도체 디바이스를 제작하는데 있어 기판을 미세하게 가공하는 프로세스에 사용되어 광 또는 엑스선, 전자선등의 조사에 의해 미세화상의 패턴을 얻는 용도로 쓰이는 광산발생제로 사용되는 신규물질 및 그 제조방법에 관한 것이다. |
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