MONITORING OF EFFLUENT FROM CHAMBER AND CHAMBER CLEANING APPARATUS

PURPOSE: A monitoring of effluent from chamber is provided to stop processing after a predetermined period or to determine a process endpoint, such as an endpoint of a chamber cleaning process, and to clean chamber walls and surfaces without erosion of chamber surfaces. CONSTITUTION: An energizing c...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TSAI KENNETH, PHAM QUYEN, BACH TUNG
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE: A monitoring of effluent from chamber is provided to stop processing after a predetermined period or to determine a process endpoint, such as an endpoint of a chamber cleaning process, and to clean chamber walls and surfaces without erosion of chamber surfaces. CONSTITUTION: An energizing cell(22) is adapted to receive an effluent. A gas energizer(17) is able to energize the effluent in the cell(22) to emit a radiation. A radiation permeable window(27) is spaced apart from an interior wall 36 of the(22) cell by a distance d that is sufficiently high to reduce a deposition of effluent residue from the energized gas on the window(27), A detector(26) detects the radiation.