METHOD FOR MAKING MASK OF SEMICONDUCTOR APPARATUS

PURPOSE: A method for making mask of semiconductor apparatus is provided to solve a problem that an unnecessary material remains at a scribe line area by making a mask using a thulium(tm) blocking a long-wavelength light for an alignment and transmitting a short-wavelength light for exposing the scr...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SHIN, HYE SU
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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