METHOD FOR MAKING MASK OF SEMICONDUCTOR APPARATUS

PURPOSE: A method for making mask of semiconductor apparatus is provided to solve a problem that an unnecessary material remains at a scribe line area by making a mask using a thulium(tm) blocking a long-wavelength light for an alignment and transmitting a short-wavelength light for exposing the scribe line area, and covering filter coated with thulium on the upper side of the scribe line area. CONSTITUTION: A process forms a material and a chrome blocking a long-wavelength light and transmitting a short-wavelength light on the upper side of a substrate, and then enforces a picture and an etch process for patterning the chrome. The process, when the chrome is patterned, forms a photoresist film on the upper side of a mask being put on a cell area, and then stacks the material blocking the long-wavelength light and transmitting the short-wavelength light by using the patterned chrome. The process eliminates the patterned chrome from the scribe line area. The process eliminates the photoresist film from the cell area.