WAFER LOADING BOAT OF SEMICONDUCTOR VERTICAL DIFFUSION FURNACE

PURPOSE: A wafer loading boat of a semiconductor vertical diffusion furnace is provided to prevent adjacent wafers from colliding with each other, by preventing the wafers from drooping even if the wafers are unstably loaded in a boat. CONSTITUTION: A plurality of supporting bars(22) are coupled to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: JUNG, DONG OK
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE: A wafer loading boat of a semiconductor vertical diffusion furnace is provided to prevent adjacent wafers from colliding with each other, by preventing the wafers from drooping even if the wafers are unstably loaded in a boat. CONSTITUTION: A plurality of supporting bars(22) are coupled to an edge portion between upper and lower plates, separated by a predetermined interval. An insertion groove(22a) is for formed that a plurality of wafers(30) are inserted and settled in a lengthwise direction of the supporting bars. A plurality auxiliary supporting bars(24) are disposed in parallel between the supporting bars, separated by a predetermined interval. A hanging protrusion(24a) is protruded to support the wafer so that the wafer does not droop in the lengthwise direction of the auxiliary bars.