TUBE FOR DEPOSITING CHEMICAL VAPOR

PURPOSE: A tube for depositing chemical vapor is to integrally form a gas injecting pipe and a discharging pipe at a tube to simplify an internal structure and inject and discharge gas corresponding to a position of a wafer loaded in a boat, thereby uniformly forming a film on the wafer. CONSTITUTIO...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: AHN, JAE HYEOK, YANG, CHANG JIP, KIM, TAE CHEOL
Format: Patent
Sprache:eng ; kor
Schlagworte:
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Beschreibung
Zusammenfassung:PURPOSE: A tube for depositing chemical vapor is to integrally form a gas injecting pipe and a discharging pipe at a tube to simplify an internal structure and inject and discharge gas corresponding to a position of a wafer loaded in a boat, thereby uniformly forming a film on the wafer. CONSTITUTION: A gas injecting pipe(31) has a plurality of injecting ports for injecting gas. A gas discharging pipe(32) has a plurality of discharging ports for discharging internal gas. The gas-injecting pipe and the gas-discharging pipe are integrally formed at a tube(30). A rotating unit(40) is disposed at a lower portion of the tube to rotate a boat(43) in which a wafer is loaded. A partition plate is disposed at an inner portion of the gas-injecting pipe. The gas injecting ports are formed at both sides with the partition plate in the center. The rotating unit has a gas supplying port(44) for supplying purified gas and a gas discharging port(45). A discharge gas guiding plate(35) for guiding the gas to a discharging passage is disposed at an inner portion of the tube.