TUBE FOR DEPOSITING CHEMICAL VAPOR
PURPOSE: A tube for depositing chemical vapor is to integrally form a gas injecting pipe and a discharging pipe at a tube to simplify an internal structure and inject and discharge gas corresponding to a position of a wafer loaded in a boat, thereby uniformly forming a film on the wafer. CONSTITUTIO...
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Format: | Patent |
Sprache: | eng ; kor |
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Zusammenfassung: | PURPOSE: A tube for depositing chemical vapor is to integrally form a gas injecting pipe and a discharging pipe at a tube to simplify an internal structure and inject and discharge gas corresponding to a position of a wafer loaded in a boat, thereby uniformly forming a film on the wafer. CONSTITUTION: A gas injecting pipe(31) has a plurality of injecting ports for injecting gas. A gas discharging pipe(32) has a plurality of discharging ports for discharging internal gas. The gas-injecting pipe and the gas-discharging pipe are integrally formed at a tube(30). A rotating unit(40) is disposed at a lower portion of the tube to rotate a boat(43) in which a wafer is loaded. A partition plate is disposed at an inner portion of the gas-injecting pipe. The gas injecting ports are formed at both sides with the partition plate in the center. The rotating unit has a gas supplying port(44) for supplying purified gas and a gas discharging port(45). A discharge gas guiding plate(35) for guiding the gas to a discharging passage is disposed at an inner portion of the tube. |
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