NOZZLE ARRANGEMENT STRUCTURE OF PROCESS CHAMBER

PURPOSE: A nozzle arrangement structure of a process chamber is to maintain an appropriate gap between an end of a nozzle and a sidewall of the process chamber, thereby preventing the deformation of an anodizing coating on a periphery of the nozzle. CONSTITUTION: A nozzle arrangement structure of a process chamber comprises a side wall(2) for forming a closed space within the process chamber; a wafer holder disposed within the process chamber for fixing a wafer; a nozzle(3) for supplying a process gas to the process chamber; and a radio frequency power device for supplying the radio frequency power to the process chamber. The sidewall of the process chamber comprises an anodizing coating(4) so as to process a high purity of the wafer. The anodizing coating is made from an aluminum material. An end of the nozzle is protruded to the process chamber. The gap(d) between the end of the nozzle and the sidewall is maintained to be about 25 to 30 millimeters.