CLEANING WATER STABILIZING APPARATUS OF THE CLEANING TUB FOR MANUFACTURING SEMICONDUCTOR WAFER

PURPOSE: A cleaning wafer stabilizing apparatus of a cleaning tube method for etching a semiconductor device is provided to maintain a contact supply speed of a cleaning water, and prevents an eddy current caused by a washing water. CONSTITUTION: Many supply holes(21) receiving a cleaning water for washing a wafer(W) are provided to a supply tube(20), and a discharge groove is formed on an upper part of the washing tub(10). The supply tube(20) has an ending point larger than a starting point so that a speed of washing water discharged from the holes(21)is to be constant. A discharge groove is formed to an upper part of the washing tub(10). A discharge groove(11a) formed on a surrounding direction of the wafer(W) seated on the washing tub(10) is deeper than another discharge groove(11b) formed in a center direction of the wafer(W). Thereby, a poor productivity caused by a bad cleaning operation can be prevented.