METHOD FOR IN-LINE MONITORING CONTACT HOLE USING ELECTRON BEAM TESTING APPARATUS

METHOD FOR IN-LINE MONITORING CONTACT HOLE USING ELECTRON BEAM TESTING APPARATUS

PURPOSE: A method for in-line monitoring a contact hole using an electron beam testing apparatus is provided to monitor if a contact hole is open in an in-line state, by using a semiconductor substrate in which a conductive pad is formed in the contact hole. CONSTITUTION: A semiconductor substrate(1...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE, SANG MYEON, KIM, YANG HYEONG, KANG, HYO CHEON, KIM, DEOK YONG
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:PURPOSE: A method for in-line monitoring a contact hole using an electron beam testing apparatus is provided to monitor if a contact hole is open in an in-line state, by using a semiconductor substrate in which a conductive pad is formed in the contact hole. CONSTITUTION: A semiconductor substrate(101) in which a conductive pad(115) is open is prepared. An electron beam is applied to the semiconductor substrate in which a conductive pad is open. The number of electrons emitted from the conductive pad is detected to determine if the contact hole is open.