APPARATUS FOR ANALYZING HYDROGEN PEROXIDE IN SEMICONDUCTOR MANUFACTURING PROCESS

PURPOSE: An apparatus for analyzing hydrogen peroxide in a semiconductor manufacturing process is provided to eliminate an analysis disturbing material without giving an excessive mechanical force to the surface of an optical mask. CONSTITUTION: An apparatus(100) for analyzing hydrogen peroxide comp...

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Bibliographische Detailangaben
Hauptverfasser:	YANG, I UK, JIN, BYEONG CHEOL
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: An apparatus for analyzing hydrogen peroxide in a semiconductor manufacturing process is provided to eliminate an analysis disturbing material without giving an excessive mechanical force to the surface of an optical mask. CONSTITUTION: An apparatus(100) for analyzing hydrogen peroxide comprises a platinum filling tube(110), a condensed column(120) and a cooling system(130). The platinum filling tube is filled with platinum power to analyze the hydrogen peroxide to water and oxygen. The condensed column eliminates oxygen generated in analyzing the hydrogen peroxide and densifies analyzed ions, connected to the platinum filling tube. The cooling system is established to surround an outer circumferential surface of the platinum filling column so that the heat generated in analyzing the hydrogen peroxide is cooled down.