ACID-CATALYTIC PHOTORESIST COMPOSITION

PURPOSE: An acid-catalytic photoresist composition is provided which shows excellent properties such as improved contrast(solubility differential), contraction rate, processing speed and the like and etching-resistant property when being exposed to light. CONSTITUTION: A photoresist composition comprises: (a) a lightly cross-linked polymer which contains an aromatic pendant group having a polar functional group and has an acid-unstable cross-linked bond; and (ii) a photosensitive acid generator, wherein the lightly cross-linked polymer comprises a structure of the following formula 1, where (i) k, l, m and n are independently 0 or 1, provided that (k+1) is more than 1 and (m+n) is more than 1; (ii) X is a component which bonds with oxygen of the adjacent carboxyl functional group to form more than acid-decomposable bonds; (iii) M and M' are independently selected from the group consisting of a moiety of ethylene main-branch, a moiety of cycloalkyl and a moiety of polycyclic alkyl; (iv) Z and Z' are independently selected from phenyl and cycloalkyl; (v) p and q are independently 0 or 1; (vi) Q is a polymer structure comprising a unit having a structure of the following formula 2; (vii) R¬1 is a polar group selected from the group consisting of H, carboxyl and other base-soluble moiety; and (viii) R¬2 is H or alkyl group.