METHOD FOR FABRICATING IMAGE SENSOR

PURPOSE: A method for fabricating an image sensor is provided to be capable of monitoring an optical characteristic at any time during forming an image sensor. CONSTITUTION: A method for fabricating an image sensor comprises the steps of forming a dummy photo diode element(104) at a scribe region(10...

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Bibliographische Detailangaben
Hauptverfasser:	HWANG, JEONG WOONG, CHA, HAN SEOB
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A method for fabricating an image sensor is provided to be capable of monitoring an optical characteristic at any time during forming an image sensor. CONSTITUTION: A method for fabricating an image sensor comprises the steps of forming a dummy photo diode element(104) at a scribe region(102) of a wafer in the same process as an actual photo diode element(103), depositing the same films on the dummy photo diode element as deposited on the actual photo diode element, and measuring a refractive index against the films formed on the dummy photo diode element.