DIAPHRAGM FOR EXPOSURE EQUIPMENT AND METHOD FOR MANUFACTURING THE SAME

PURPOSE: A method for manufacturing a diaphragm for an exposure equipment is provided to maintain the resolution and improve the light transmitting degree. CONSTITUTION: A first resist pattern is formed in a selected area on a substrate. A first optical shielding material is formed on the substrate,...

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Bibliographische Detailangaben
Hauptverfasser:	CHO, GYUNG IK, LEE, GAK HYUN, CHOI, SANG SU, KIM, JONG SU, CHA, HAN SEON, KIM, DO HUN, JEONG, HAE BIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: A method for manufacturing a diaphragm for an exposure equipment is provided to maintain the resolution and improve the light transmitting degree. CONSTITUTION: A first resist pattern is formed in a selected area on a substrate. A first optical shielding material is formed on the substrate, which includes the first resist pattern. After the first resist pattern is removed, a second resist is formed on the structure. Then, the central portion of the second resist is removed. After a second optical shielding material is formed on the structure, the second resist is removed.