KNIFE EDGE RING, INNER CUP AND WAFER POLLUTION PREVENTER IN SEMICONDUCTOR DEVELOPMENT EQUIPMENT

PURPOSE: A knife edge ring in a semiconductor development equipment is provided to induce flow of a fluid by a declined face. Inner cups in a semiconductor development equipment are provided, so that directions of fluid supply by the inner cups are different. A wafer pollution preventer in a semiconductor development equipment are provided to prevent chemical pollution to a rear face of a wafer. CONSTITUTION: A blocking face is formed on an upper side of the knife edge ring(46) in a semiconductor development equipment. The blocking face blocks a fluid or a fluid drop to rear face of a wafer(10) being developed. Declined faces are formed at each side of the blocking face to induce the fluid or fluid drop. Center portion of the knife edge ring(46) is empty. A chuck(30) is through a hole which is formed at center of inner cups(40) having 1st and 2nd spray holes. In a wafer pollution preventer, supply holes of wash fluid and gas are on a different location.