PROCESSING MONITORING APPARATUS OF SEMICONDUCTOR DEVICES FABRICATION FACILITY
PURPOSE: A processing monitoring apparatus of semiconductor devices fabrication facility is provided to display a measured data by a measuring facility after completing a process, by installing a process having a memory and a monitor in a fabrication facility. CONSTITUTION: A fabrication facility(1)...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | PURPOSE: A processing monitoring apparatus of semiconductor devices fabrication facility is provided to display a measured data by a measuring facility after completing a process, by installing a process having a memory and a monitor in a fabrication facility. CONSTITUTION: A fabrication facility(1) comprises a process having a memory and a monitor which supply the measured data of a measuring facility(3) to the fabrication facility via a host computer(2) and displays the measured data after completing the process by receiving and editing the measured data. Thus, the thickness, the resistance and the dust displayed on the monitor can be checked in the fabrication facility.
본 발명은 제조설비에 두께, 저항, 먼지 등을 모니터하는 시스템이 없다는 점을 감안하여 제안된 것으로, 이는 제조설비의 계측 데이터를 호스트 컴퓨터를 경유하여 제조설비로 공급하고, 제조설비에는 이 계측 데이터를 입력받아 작업자가 보기 쉬운 형태로 편집하여 공정 완료후 디스플레이하는 메모리를 갖는 프로세서와 모니터를 구비하여 제조설비에서도 두께, 저항, 먼지 등의 데이터를 확인할 수 있는 것이다. |
|---|