METHOD OF FORMING A SEMICONDUCTOR DEVICE

PURPOSE: A semiconductor device forming method is provided to reduce a cost by varying a process so as to form a transistor of a lightly doped drain(LDD) structure without forming a separate spacer. CONSTITUTION: The method of forming a semiconductor device comprises the steps of: sequentially formi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YUN, KWANG JUN, KIM, GOOK MIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!