Release film and manufacturing method thereof

Disclosed are a release film and a preparation method thereof. The release film comprises a release layer on at least one surface of a substrate. The release layer comprises phase-separated first and second areas. The first area is located adjacent to the substrate and comprises a cured body of a si...

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Bibliographische Detailangaben
Hauptverfasser:	WOO HYE MI, SHIN JUN HO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES FILLING PASTES INKS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	Disclosed are a release film and a preparation method thereof. The release film comprises a release layer on at least one surface of a substrate. The release layer comprises phase-separated first and second areas. The first area is located adjacent to the substrate and comprises a cured body of a silicone release agent. The second area is located on a surface of the release layer and comprises a cured body of a fluorinated silicone release agent. A contact angle with diiodomethane on the surface of the release layer is 85 to 95 degrees. The content of Si element with respect to F element according to the XPS analysis of the surface of the release layer satisfies following equation 1. A rate of change in the peel force of the surface of the release layer satisfies following equation 2. Equation 1 is represented by 1.0