Composite polishing pad including carbon nanotubes and method for manufacturing the same

The present invention is to provide a composite polishing pad for chemical mechanical polishing (CMP) with greatly improved polishing performance and lifespan, and an efficient manufacturing method thereof. According to the present invention, the composite polishing pad for CMP comprises: a polymer...

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Bibliographische Detailangaben
Hauptverfasser:	JEONG JI HUN, RYU HYUN JUN, MIN BYUNG JU, KANG SUK KYUNG, KANG MIN WOO, HONG SEOK JI, KIM SEUNG GEUN, CHOI JUNG HEE, KIM SAN HA, OH NAM GUE, KIM SEONG JAE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TOOLS FOR GRINDING, BUFFING, OR SHARPENING TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	The present invention is to provide a composite polishing pad for chemical mechanical polishing (CMP) with greatly improved polishing performance and lifespan, and an efficient manufacturing method thereof. According to the present invention, the composite polishing pad for CMP comprises: a polymer base layer including a plurality of protrusions formed on the upper surface; and a carbon nanotube layer including carbon nanotubes embedded and fixed to the upper surface of the base layer. 본 발명은 상부면에 성형된 다수개의 돌기를 포함하는 폴리머 기재층; 및 상기 기재층 상부면에 함입되어 고정된 탄소나노튜브들을 포함하는 탄소나노튜브층;을 포함하는 CMP용 복합 연마패드 및 이의 제조방법을 제공한다.